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论文摘要

Mg掺杂GaN结构及电子结构的理论研究

Theoretical study on structure and electronic structure of GaN with Mg doped

作者:王海燕(河南理工大学材料科学与工程学院);李旭升(河南理工大学材料科学与工程学院);李丹(攀枝花学院材料工程学院);姚彦文(河南理工大学材料科学与工程学院)

Author:WANG Hai-Yan(School of Materials Science and Engineering, Henan Polytechnic University);LI Xu-Sheng(School of Materials Science and Engineering, Henan Polytechnic University);LI Dan(School of Materials Engineering, Panzhihua University);YAO Yan-Wen(School of Materials Science and Engineering, Henan Polytechnic University)

收稿日期:2017-06-15          年卷(期)页码:2017,54(5):997-1000

期刊名称:四川大学学报: 自然科学版

Journal Name:Journal of Sichuan University (Natural Science Edition)

关键字:掺杂;高压;带隙;第一性原理

Key words:Doping; High pressure; Band gap; First principle

基金项目:国家自然科学基金,其它

中文摘要

采用基于密度泛函理论的赝势平面波方法研究了金属元素Mg掺杂GaN的结构及电子结构性质。计算金属Mg分别替换Ga和N原子后体系的结合能,得到Mg原子更容易替换Ga原子,与他人的结果一致。掺杂后晶格常数a和c反而略有增大,并且高压下的情况是类似的。Mg掺杂后GaN电子结构显示掺杂使得GaN带隙略有增加,压强从0GPa增加到20GPa,掺杂前后带隙值分别增大约39.1%和38.4%。

英文摘要

The structure and electronic structure properties of GaN doped with Mg are studied by plane-wave pseudopotential density functional theory method. By calculating the binding energy of systems with Mg replacing the Ga and N atoms respectively, it is easier for Mg atoms to replace the Ga atoms, which is consistent with the results of others. The lattice constants a and c are slightly increased after doping, and the case under high pressure is similar. With the pressure increasing from 0 GPa to 20 GPa, the band gaps of the GaN and the doped-GaN increase by about 39.1% and 38.4%, respectively.

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