Objective This study aims to investigate the influence of placing depth of implants with platform switching on stress distribution in peri-implant bone according to typeⅡbone area to provide reference for clinical application. Methods CT scanning technology and software, such as Mimics 10.01, Solid Works 2007, and ANSYS 14.0, were used to establish five finite element models consisting of type Ⅱ bone of the anterior maxillary, implant with platform switching, and superstructure and incisor crown based on five different insertion depths. The stress distribution characteristics of peri-implant bone under vertical 100 N and inclined 100 N loading were investigated. Results The peri-implant bone stress was mainly concentrated in the contact area of the implant neck platform and cortical bone and shifted down at a deeper placing level. The burden of alveolar crest was reduced. The maximum Von-mises stress was effectively reduced when the placing depth was 1 mm below the alveolar crest level. The maximum Von-mises stresses under inclined loading were higher than those under vertical loading. Conclusion The implant neck platform should be located in the cortical bone. Placement at 1 mm below the alveolar crest level in the typeⅡ bone area can improve the stress distribution of the marginal bone.
