高通量氢等离子体对CX-2002U碳复合材料的化学侵蚀研究
Erosion of CX-2002U composites under high-flux hydrogen plasma
作者:郭恒鑫(四川大学原子与分子物理研究所,四川大学原子核科学技术研究所);王博(四川大学原子核科学技术研究所);叶宗标(四川大学原子核科学技术研究所);陈建军(四川大学原子核科学技术研究所);陈波(四川大学原子核科学技术研究所);张坤(四川大学原子核科学技术研究所);韦建军(四川大学原子与分子物理研究所);芶富均(四川大学原子核科学技术研究所)
Author:GUO Heng-Xin(Institute of Atomic and Molecular Physics, Sichuan University);WANG Bo(Institute of Nuclear Science and Technology, Sichuan University);YE Zong-Biao(Institute of Nuclear Science and Technology, Sichuan University);CHEN Jian-Jun(Institute of Nuclear Science and Technology, Sichuan University);CHEN Bo(Institute of Nuclear Science and Technology, Sichuan University);ZHANG Kun(Institute of Nuclear Science and Technology, Sichuan University);WEI Jian-Jun(Institute of Atomic and Molecular Physics, Sichuan University);GOU Fu-Jun(Institute of Nuclear Science and Technology, Sichuan University)
收稿日期:2019-11-11 年卷(期)页码:2020,57(6):1152-1156
期刊名称:四川大学学报: 自然科学版
Journal Name:Journal of Sichuan University (Natural Science Edition)
关键字:碳纤维复合材料;氢等离子体;杂质;化学侵蚀;再沉积
Key words:Carbon fiber composite; Hydrogen plasma; Impurity; Chemical erosion; Redeposition
基金项目:国家自然科学基金,中国博士后基金
中文摘要
针对HL-2M偏滤器等离子体对碳材料的侵蚀问题,通过使用直线等离子体装置(SCU-PSI)模拟偏滤器的工况以探究高通量氢等离子体对CX-2002U碳纤维复合材料的侵蚀行为,从而为此材料能否用于HL-2M装置的偏滤器提供依据. 在通量恒定(1.48×1023 m-2s-1)的条件下,通过研究不同辐照时间下氢等离子体对样品的化学侵蚀发现,氢等离子体对样品的侵蚀是一个随时间周期变化的过程. 此外,通过在氢气中混入杂质气体探究了杂质对氢等离子体侵蚀样品的影响并发现,氢等离子体中的杂质通过侵蚀沉积在样品表面的碳颗粒以增强其对样品的侵蚀.
英文摘要
Aiming at the erosion of CX-2002U carbon composite under the hydrogen plasma of HL-2M divertor, the influence of hydrogen plasma on it is investigated by using the linear plasma device (SCU-PSI) to simulate the operating environment of HL-2M. Under the condition of constant flux, it is found that the erosion of samples by hydrogen plasma is a cycle process through studying the chemical erosion of samples by hydrogen plasma with different irradiation time. In addition, it is found that the impurities in the hydrogen plasma can enhance the erosion of samples as the impurity gases are injected into hydrogen gas.
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